Ni2Si: enthalpy of formation

4 accepted literature formation-enthalpy value(s) (experimental 2, model 2); experimental median -48.75 kJ/mol-atom (n = 2); Materials Project -53.015 kJ/mol-atom (mp-aaaaabra); OQMD -53.941 kJ/mol-atom (oqmd-4675).

Systems: Ni–Si

Literature values

Enthalpy of formation of Ni2Si reported in the literature (4)
ValuePhase as printedT (K)ClassMethodSystemSourceLocationQuote
-50.6 kJ/mol-atomNi2Si(δ)298.15experimentalNi–Si[1] Tokunaga 2003
cites Meschel 1998 doi
Table 4, p. 7, row 3
report
-46.9 kJ/mol-atomNi2Si(δ)298.15experimentalNi–Si[1] Tokunaga 2003
cites Oelson 1936
Table 4, p. 7, row 1
report
-47.6 kJ/mol-atomNi2Si(δ)modelCALPHAD assessmentNi–Si[1] Tokunaga 2003Table 4, p. 7, row 5
report
-41.7 kJ/mol-atomNi2Si(δ)modelNi–Si[1] Tokunaga 2003
cites Lindholm 1996 doi
Table 4, p. 7, row 6
report

Uncertainty budget

Components kept separate, in the value's unit (literature SCHEMA.md, UNCERTAINTY_CALIBRATION.md): effective = max(sqrt(max(printed, reading, method)^2 + composition^2 + conversion^2), scatter). The method floor is the robust between-study scatter of the method class in ORCHID (calibrated) or a documented prior; printed values and printed uncertainties are unchanged.

Uncertainty budget of the literature values of Ni2Si
ValueUnitPrintedReadingMethod (class, basis)CompositionScatterConversionEffective
-50.6kJ/mol-atom0.053.5 (unknown, calibrated)3.5
-46.9kJ/mol-atom0.053.5 (unknown, calibrated)3.5
-47.6kJ/mol-atom0.053.9 (model_calculated, calibrated)3.9
-41.7kJ/mol-atom0.053.9 (model_calculated, calibrated)3.9

DFT formation energies

Lowest-energy entries at this composition. Materials Project and OQMD use different energy references and are never averaged. 1 eV/atom = 96.485 kJ/mol-atom.

DFT formation energy of Ni2Si
SourceEntrykJ/mol-atomeV/atomSpace groupE above hull (kJ/mol-atom)E above hull (eV/atom)Theoretical
Materials Projectmp-aaaaabra-53.015-0.549459Pnma00no
OQMDoqmd-4675-53.941-0.559065Pnma00no

DFT sources: A. Jain et al., Commentary: The Materials Project: A materials genome approach to accelerating materials innovation, APL Materials 1 (2013) 011002. doi:10.1063/1.4812323 (CC BY 4.0); J. E. Saal et al., JOM 65 (2013) 1501-1509; S. Kirklin et al., npj Comput. Mater. 1 (2015) 15010. doi:10.1007/s11837-013-0755-4 (CC BY 4.0);

Sources

  1. Tatsuya Tokunaga, Kazumasa Nishio, Hiroshi Ohtani, Mitsuhiro Hasebe, Thermodynamic assessment of the Ni–Si system by incorporating ab initio energetic calculations into the CALPHAD approach, Calphad 27, 161-168 (2003). doi:10.1016/s0364-5916(03)00049-x