Si2Te3: enthalpy of formation
5 accepted literature formation-enthalpy value(s) (experimental 5); experimental median -14.4 kJ/mol-atom (n = 5).
Systems: Si–Te
Literature values
| Value | Phase as printed | T (K) | Class | Method | System | Source | Location | Quote |
|---|---|---|---|---|---|---|---|---|
| -18.4 kJ/mol-atom ± 2.6 | α-Si2Te3 | 298.15 | experimental | 2nd Law | Si–Te | [1] Feutelais 1999 cites EXSTEEN 1967 | Table 2, p. 9, row 3 report | |
| -17.8 kJ/mol-atom ± 3.8 | α-Si2Te3 | 298.15 | experimental | 3rd Law | Si–Te | [1] Feutelais 1999 cites EXSTEEN 1967 | Table 2, p. 9, row 4 report | |
| -14.4 kJ/mol-atom ± 1 | α-Si2Te3 | 298.15 | experimental | 3rd Law | Si–Te | [1] Feutelais 1999 cites ref. 13 | Table 2, p. 9, row 6 report | |
| -14.2 kJ/mol-atom ± 1.2 | α-Si2Te3 | 298.15 | experimental | calorimetry | Si–Te | [1] Feutelais 1999 cites OHARE 1993 | Table 2, p. 9, row 7 report | |
| -13.8 kJ/mol-atom ± 1.4 | α-Si2Te3 | 298.15 | experimental | 2nd Law | Si–Te | [1] Feutelais 1999 cites ref. 13 | Table 2, p. 9, row 5 report |
Uncertainty budget
Components kept separate, in the value's unit (literature SCHEMA.md, UNCERTAINTY_CALIBRATION.md): effective = max(sqrt(max(printed, reading, method)^2 + composition^2 + conversion^2), scatter). The method floor is the robust between-study scatter of the method class in ORCHID (calibrated) or a documented prior; printed values and printed uncertainties are unchanged.
| Value | Unit | Printed | Reading | Method (class, basis) | Composition | Scatter | Conversion | Effective |
|---|---|---|---|---|---|---|---|---|
| -18.4 | kJ/mol-atom | 2.6 | 0.1 | 3 (kems_vapour_second_law, prior) | 3 | |||
| -17.8 | kJ/mol-atom | 3.8 | 0.1 | 2 (kems_vapour_third_law, prior) | 3.8 | |||
| -14.4 | kJ/mol-atom | 1 | 0.1 | 2 (kems_vapour_third_law, prior) | 2 | |||
| -14.2 | kJ/mol-atom | 1.2 | 0.1 | 3.2 (solution_reaction_calorimetry, calibrated) | 3.2 | |||
| -13.8 | kJ/mol-atom | 1.4 | 0.1 | 3 (kems_vapour_second_law, prior) | 3 |
Sources
- Y. Feutelais, A. Schlieper, S.G. Fries, Thermodynamic evaluation of the system silicon — Tellurium, Calphad 23, 365-378 (1999). doi:10.1016/s0364-5916(00)00007-9