TaV2: enthalpy of formation

5 accepted literature formation-enthalpy value(s) (model 3, unspecified 2); Materials Project -10.061 kJ/mol-atom (mp-aaabghei); OQMD -12.128 kJ/mol-atom (oqmd-1365869).

Systems: Ta–V

Literature values

Enthalpy of formation of TaV2 reported in the literature (5)
ValuePhase as printedT (K)ClassMethodSystemSourceLocationQuote
-11.7 kJ/mol-atomTaV2modelTa–V[1] Broz 2013
cites Charifi 2009
Table 2, p. 6, row 2
report
-11.4 kJ/mol-atomTaV20modelTa–V[1] Broz 2013
cites Pavlu 2011 doi
Table 2, p. 6, row 3
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-10.2 kJ/mol-atomTaV20modelTa–V[1] Broz 2013
cites Pavlu 2011 doi
Table 2, p. 6, row 5
report
-11.4 kJ/mol-atomTaV20unspecifiedTa–V[1] Broz 2013Table 2, p. 6, row 1
report
-10.2 kJ/mol-atomTaV20unspecifiedTa–V[1] Broz 2013Table 2, p. 6, row 4
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Uncertainty budget

Components kept separate, in the value's unit (literature SCHEMA.md, UNCERTAINTY_CALIBRATION.md): effective = max(sqrt(max(printed, reading, method)^2 + composition^2 + conversion^2), scatter). The method floor is the robust between-study scatter of the method class in ORCHID (calibrated) or a documented prior; printed values and printed uncertainties are unchanged.

Uncertainty budget of the literature values of TaV2
ValueUnitPrintedReadingMethod (class, basis)CompositionScatterConversionEffective
-11.7kJ/mol-atom0.053.9 (model_calculated, calibrated)3.9
-11.4kJ/mol-atom0.053.9 (model_calculated, calibrated)3.9
-10.2kJ/mol-atom0.053.9 (model_calculated, calibrated)3.9
-11.4kJ/mol-atom0.053.5 (unknown, calibrated)3.5
-10.2kJ/mol-atom0.053.5 (unknown, calibrated)3.5

DFT formation energies

Lowest-energy entries at this composition. Materials Project and OQMD use different energy references and are never averaged. 1 eV/atom = 96.485 kJ/mol-atom.

DFT formation energy of TaV2
SourceEntrykJ/mol-atomeV/atomSpace groupE above hull (kJ/mol-atom)E above hull (eV/atom)Theoretical
Materials Projectmp-aaabghei-10.061-0.104278Fd-3m00no
OQMDoqmd-1365869-12.128-0.125698P63/mmc00yes

DFT sources: A. Jain et al., Commentary: The Materials Project: A materials genome approach to accelerating materials innovation, APL Materials 1 (2013) 011002. doi:10.1063/1.4812323 (CC BY 4.0); J. E. Saal et al., JOM 65 (2013) 1501-1509; S. Kirklin et al., npj Comput. Mater. 1 (2015) 15010. doi:10.1007/s11837-013-0755-4 (CC BY 4.0);

Sources

  1. P. Broz, A.U. Khan, H. Niu, X.-Q. Chen, D. Li, J. Vrestal et al., The system Ta–V–Si: Thermodynamic modeling, Journal of Solid State Chemistry 199, 171-180 (2013). doi:10.1016/j.jssc.2012.12.003