Thermodynamic properties of vanadium silicides. I. Standard molar enthalpy of formation of vanadium disilicide (VSi ) at the temperature 298.15 K
P.A.G. O’Hare, K. Watling, G.A. Hope
The Journal of Chemical Thermodynamics 31 (11) 1385-1395 (1999) · Elsevier BV
Data: JSON record · id doi:10.1006/jcht.1999.0579 · metadata: crossref
Roles in ORCHID
- cited as the original source of values
Systems
Evidence in ORCHID
1 values in 1 other papers cite this work as their source.
| experimental | 1 |
ESPEI datasets derived: 1 (experimental/SI-V/SiV-08Zha.hmr-04-SI2V_C40.json).
Availability
Read by ORCHID: no (full_text_screened_for_origin). Open-access licence (Crossref license field): none deposited. Crossref is-referenced-by count: 8 (retrieved 2026-10-23).
Relations
Cited by (Crossref reference lists) (5)
- Thermodynamic properties of vanadium silicides II. Standard molar enthalpy of formation (298.15 K) and reassessed thermodynamic properties of trivanadium monosilicide (V Si) (2000) [crossref_reference_list]
- An investigation on the thermodynamic stability of V6Si5 (2007) [crossref_reference_list]
- Thermodynamic modeling of the V–Si system supported by key experiments (2008) [crossref_reference_list]
- Enthalpies of formation of TM–X compounds (X=Al, Ga, Si, Ge, Sn). Comparison of ab-initio values and experimental data (2016) [crossref_reference_list]
- The system Ta–V–Si: Thermodynamic modeling (2013) [crossref_reference_list]
References (Crossref, publisher-deposited) (1)
- The Si−V (Silicon-Vanadium) system (1981) [crossref_reference_list]
Cited for values by (1)
- Thermodynamic modeling of the V–Si system supported by key experiments (2008) — 1 values [orchid_extraction]
Used in (assessments / papers that took values from it) (1)
- Thermodynamic modeling of the V–Si system supported by key experiments (2008) — 1 values [orchid_extraction]