Silicides of ruthenium and osmium: Thin film reactions, diffusion, nucleation, and stability
C. S. Petersson, J. E. E. Baglin, J. J. Dempsey, F. M. d’Heurle, S. J. La Placa
Journal of Applied Physics 53 (7) 4866-4883 (1982) · AIP Publishing
DOI: 10.1063/1.331319
Data: JSON record · id doi:10.1063/1.331319 · metadata: crossref
Roles in ORCHID
- cited as the original source of values
Systems
Evidence in ORCHID
2 values in 1 other papers cite this work as their source.
| model | 2 |
Phase-registry phases citing it: phase:ru-si:ru2si3, phase:ru-si:rusi
Availability
Read by ORCHID: no. Open-access licence (Crossref license field): none deposited. Crossref is-referenced-by count: 73 (retrieved 2026-10-23).
Relations
Cited by (Crossref reference lists) (2)
- Enthalpies of formation of RuSi and RuSn compounds by direct reaction calorimetry (1997) [crossref_reference_list]
- Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) [crossref_reference_list]
Cited for values by (1)
- Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) — 2 values [orchid_extraction]
Used in (assessments / papers that took values from it) (1)
- Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) — 2 values [orchid_extraction]