Ru–Si: papers in ORCHID

Data: JSON · all systems

Assessments and the data papers they used

cited as the original source of values (11)

• Reaction of thin metal films with SiO2 substrates (1978)
• Correction terms to pair potential model values of the energy of formation for transition element-polyvalent element phases (1981)
• Silicides of ruthenium and osmium: Thin film reactions, diffusion, nucleation, and stability (1982)
• Heat Capacity and Heat Content Measurements on Binary Compounds in the Ru–Si, Ru–Ge, and Ru–Sn Systems (1997)
• Enthalpies of formation of RuSi and RuSn compounds by direct reaction calorimetry (1997)
• Preparation and low temperature properties of FeSi-type RuSi (1997)
• IV. Progress in experimental methods: Thermodynamic investigations in the Si‐Ge‐rich part of the ruthenium‐silicon‐germanium system (1998)
• Standard enthalpies of formation of some 4d transition metal silicides by high temperature direct synthesis calorimetry (1998)
• The Ruthenium–Silicon system (1999)
• Thermodynamic assessment of the Ru–Si and Os–Si systems (2001)
• RuSi2: evidence of a new binary phase in the ruthenium–silicon system (2002)

read by ORCHID (values extracted) (2)

• Thermodynamic assessment of the Ru–Si and Os–Si systems (2001)
• Thermodynamic description of Ru–Ge–Si ternary system (2009)

discovery lead (found by Crossref assessment discovery, not read) (1)

• Thermodynamic description of Ru–Ge–Si ternary system (2009)

original evaluation behind an assessed (handbook) diagram (2)

• Thermodynamic assessment of the Ru–Si and Os–Si systems (2001)
• Ru-Si (Ruthenium-Silicon) (2006)

assessment behind a TDB file (4)

• P.-Y. Chevalier, E. Fischer, unpublished work, 1995. (1995)
• Thermodynamic assessment of the Ru–Si and Os–Si systems (2001)
• J.C. Gachon, Z. Metallkd., 92, 323-27(2001). (2001)
• Thermodynamic description of Ru–Ge–Si ternary system (2009)