Reaction of thin metal films with SiO2 substrates
R. Pretorius, J.M. Harris, M-A. Nicolet
Solid-State Electronics 21 (4) 667-675 (1978) · Elsevier BV
DOI: 10.1016/0038-1101(78)90335-0
Data: JSON record · id doi:10.1016/0038-1101(78)90335-0 · metadata: crossref
Roles in ORCHID
- cited as the original source of values
Systems
Evidence in ORCHID
1 values in 1 other papers cite this work as their source.
| experimental | 1 |
ESPEI datasets derived: 1 (experimental/RU-SI/RuSi-01Liu.hmr-04-RUSI.json).
Phase-registry phases citing it: phase:ru-si:rusi
Availability
Read by ORCHID: no (full_text_screened_for_origin). Open-access licence (Crossref license field): none deposited. Crossref is-referenced-by count: 287 (retrieved 2026-10-23).
Relations
Cited by (Crossref reference lists) (1)
- Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) [crossref_reference_list]
Cited for values by (1)
- Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) — 1 values [orchid_extraction]
Used in (assessments / papers that took values from it) (1)
- Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) — 1 values [orchid_extraction]