Preparation and low temperature properties of FeSi-type RuSi

B. Buschinger, C. Geibel, J. Diehl, M. Weiden, W. Guth, A. Wildbrett, S. Horn, F. Steglich

Journal of Alloys and Compounds 256 (1-2) 57-60 (1997) · Elsevier BV

DOI: 10.1016/s0925-8388(96)03021-6

Data: JSON record · id doi:10.1016/s0925-8388(96)03021-6 · metadata: crossref

Roles in ORCHID

cited as the original source of values

Systems

Evidence in ORCHID

1 values in 1 other papers cite this work as their source.

Cited values by evidence class
experimental	1

Availability

Read by ORCHID: no. Open-access licence (Crossref license field): none deposited. Crossref is-referenced-by count: 26 (retrieved 2026-10-23).

Relations

Cited by (Crossref reference lists) (3)

Thermodynamic description of Ru–Ge–Si ternary system (2009) [crossref_reference_list]
Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) [crossref_reference_list]
The Ruthenium–Silicon system (1999) [crossref_reference_list]

References (Crossref, publisher-deposited) (1)

The osmium-silicon phase diagram (1988) [crossref_reference_list]

Cited for values by (1)

Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) — 1 values [orchid_extraction]

Used in (assessments / papers that took values from it) (1)

Thermodynamic assessment of the Ru–Si and Os–Si systems (2001) — 1 values [orchid_extraction]